TY - JOUR
T1 - Corrigendum to “Fabrication of covellite supported spinel oxide CuCo2O4 hybrid nano-composite electrode for efficient overall water splitting” [967 (2024) 118450] (Journal of Electroanalytical Chemistry (2024) 967, (S1572665724004284), (10.1016/j.jelechem.2024.118450))
AU - Moazzam Khan, Muhammad
AU - Imran Abbas Shah, Syed
AU - Ammar Hassan Shah, Muhammad
AU - Najam-ul-Haq, Muhammad
AU - Alotaibi, Nouf H.
AU - Mohammad, Saikh
AU - Zada, Imran
AU - Naeem Ashiq, Muhammad
AU - Allakhverdiev, Suleyman I.
N1 - Publisher Copyright:
© 2024 Elsevier B.V.
PY - 2024/9/15
Y1 - 2024/9/15
N2 - The authors regret < We have observed that in the original supplied manuscript, the XRD analysis has been processed via baseline correction and smoothening operations on OriginPro Software. This has caused slight deviations from the original raw data, and could be cause confusion among readers of the journal. These slight deviations can be effectively corrected via provision of unprocessed graphs (not baseline corrected and smoothed). Thus, we would like to address this issue with original presentation of the graphs in actual form, so that there is no confusion among the readers. While this change will have no change on scientific discussion and integrity of the text.[Formula presented] Fig. 1. (a) XRD, (b) Peak shifting of Fabricated CuS, CuCo2O4 and CuS/CuCo2O4 electrode materials (c-e) W-H plots for CuS, CuCo2O4 and CuS/CuCo2O4. Similarly, XPS survey spectrum was also processed via data smoothening and baseline correction, which could cause misinterpretation of results. Thus, we have provided un-modified graphs, and Figure for XPS survey spectrum. These both changes will not effect on the scientific results as well as there will be no change in the discussion.[Formula presented] Fig. 3. (a) Survey spectrum of CuS/CuCo2O4, XPS spectrum of (b) Cu 2p, (c) S 2p, (d) Co 2p, & (e) O 1 s. We have also addressed the post stability XRD analysis, which now contains unprocessed (no baseline correction data smoothening) before and after stability XRD analysis.[Formula presented] Fig. 9. (a) Post stability XRD analysis of CuS/CuCo2O4 and (b) SEM of CuS/CuCo2O4 after stability. We sincerely apologize for this and will be more careful in the future submissions. We profoundly adhere to research ethics and values. >. The authors would like to apologise for any inconvenience caused.
AB - The authors regret < We have observed that in the original supplied manuscript, the XRD analysis has been processed via baseline correction and smoothening operations on OriginPro Software. This has caused slight deviations from the original raw data, and could be cause confusion among readers of the journal. These slight deviations can be effectively corrected via provision of unprocessed graphs (not baseline corrected and smoothed). Thus, we would like to address this issue with original presentation of the graphs in actual form, so that there is no confusion among the readers. While this change will have no change on scientific discussion and integrity of the text.[Formula presented] Fig. 1. (a) XRD, (b) Peak shifting of Fabricated CuS, CuCo2O4 and CuS/CuCo2O4 electrode materials (c-e) W-H plots for CuS, CuCo2O4 and CuS/CuCo2O4. Similarly, XPS survey spectrum was also processed via data smoothening and baseline correction, which could cause misinterpretation of results. Thus, we have provided un-modified graphs, and Figure for XPS survey spectrum. These both changes will not effect on the scientific results as well as there will be no change in the discussion.[Formula presented] Fig. 3. (a) Survey spectrum of CuS/CuCo2O4, XPS spectrum of (b) Cu 2p, (c) S 2p, (d) Co 2p, & (e) O 1 s. We have also addressed the post stability XRD analysis, which now contains unprocessed (no baseline correction data smoothening) before and after stability XRD analysis.[Formula presented] Fig. 9. (a) Post stability XRD analysis of CuS/CuCo2O4 and (b) SEM of CuS/CuCo2O4 after stability. We sincerely apologize for this and will be more careful in the future submissions. We profoundly adhere to research ethics and values. >. The authors would like to apologise for any inconvenience caused.
UR - http://www.scopus.com/inward/record.url?scp=85201443000&partnerID=8YFLogxK
U2 - 10.1016/j.jelechem.2024.118566
DO - 10.1016/j.jelechem.2024.118566
M3 - Comment/debate
AN - SCOPUS:85201443000
SN - 1572-6657
VL - 969
JO - Journal of Electroanalytical Chemistry
JF - Journal of Electroanalytical Chemistry
M1 - 118566
ER -