Possible low-k solution and other potential applications

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6 Citations (Scopus)

Abstract

Integration of low-k into a reliable semiconductor production process remains challenging and new ideas are needed. A cryptocrystalline material with possible low-k and other applications is described. The synthesis of cryptocrystals of ammonium silicon fluoride on silicon is an important step forward for the integration of a variety of materials into advanced silicon circuits. Growing low-k dielectric layers by vapor phase etching has several advantages like no electrical contacts are needed and selective processing is possible.

Original languageEnglish
Pages (from-to)31-34
Number of pages4
JournalEuropean Semiconductor
Volume26
Issue number7
Publication statusPublished - Jul 2004
Externally publishedYes

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